Near Field Quasi-null Control with Far Field Sidelobe Level Maintenance in Line Source Difference Patterns

A previously developed method to place a quasi-null in a specified angular position of the near-field line source in sum patterns while, simultaneously, the far-field sidelobe level is maintained under a desired value, is shown to be applicable to linear Bayliss patterns as well. This method, as in the previous work, is performed through the use of the Simulated Annealing technique, which allows to perturb the complex roots of the pattern in order to achieve the desired specifications. An example developed below demonstrates this accomplishment.